首页> 外国专利> SOFT X-RAY LIGHT SOURCE DEVICE AND EUV EXPOSURE APPARATUS AND ILLUMINATING METHOD

SOFT X-RAY LIGHT SOURCE DEVICE AND EUV EXPOSURE APPARATUS AND ILLUMINATING METHOD

机译:软X射线光源设备和EUV曝光装置及发光方法

摘要

PURPOSE: To make effective use of light beams from light sources when a plurality of discharge plasma light sources are bundled. CONSTITUTION: This soft X-ray light source device comprises a plurality of point light sources; a light collecting and reflecting optical system for collecting the light beams from the plurality of point light sources at one point; an angle- adjustable mirror for reflecting the light beams coming from the light sources and passed through the light collecting and reflecting optical system; and an angle control part for reflecting the light beams from the point light beams in the same direction by varying the angle of the mirror according to the light beams impinging on the mirror.
机译:目的:当多个放电等离子体光源集束在一起时,可以有效利用来自光源的光束。构成:该软X射线光源装置包括多个点光源;多个点光源。一聚光反射光学系统,用于在一个点收集来自多个点光源的光束。角度可调镜,用于反射来自光源并穿过聚光反射光学系统的光束;角度控制部分,通过根据入射在反射镜上的光束改变反射镜的角度,使点光束沿相同方向反射。

著录项

  • 公开/公告号KR20030051206A

    专利类型

  • 公开/公告日2003-06-25

    原文格式PDF

  • 申请/专利权人 NIKON CORPORATION;

    申请/专利号KR20020064424

  • 发明设计人 MURAKAMI KATSUHIKO;

    申请日2002-10-22

  • 分类号H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 23:46:50

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