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SILICON CARBIDE SINTERED COMPACT AND MEMBER FOR MANUFACTURING SEMICONDUCTOR USING THE SAME, MEMBER FOR MANUFACTURING MAGNETIC HEAD, WEAR RESISTANT SLIDING MEMBER AND METHOD OF MANUFACTURING THE SAME
SILICON CARBIDE SINTERED COMPACT AND MEMBER FOR MANUFACTURING SEMICONDUCTOR USING THE SAME, MEMBER FOR MANUFACTURING MAGNETIC HEAD, WEAR RESISTANT SLIDING MEMBER AND METHOD OF MANUFACTURING THE SAME
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机译:使用相同的制造碳化硅烧结体和构件,使用磁头制造的构件,耐磨滑动构件及其制造方法
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摘要
PROBLEM TO BE SOLVED: To provide a silicon carbide sintered compact which is used for semiconductor manufacturing members, semiconductor manufacturing tools, packaging parts, high-temperature and high-corrosion resistant members, wear resistant member, etc., is substantially poreless, is dense and is excellent in strength and hardness and has a low a cost and a method of manufacturing the same.;SOLUTION: The silicon carbide sintered compact which is substantially poreless, is dense and is excellent in the strength and hardness and has the low cost can be obtained by obtaining the silicon carbide sintered compact consisting of ≥2 phases of crystals which consist of a silicon carbide of at least ≥1 phase of an α phase or β phase and ≤3 μm average crystal particle diameter and 0.2 to 20 wt.% YAG crystal phase of ≥1 μm average crystal particle diameter and in which the YAG crystal phase is uniformly dispersed among the particles of the silicon carbide and the balance consists of inevitable impurities.;COPYRIGHT: (C)2003,JPO
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