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APPARATUS FOR CLEANING POLISHING SURFACE OF POLISHING APPARATUS
APPARATUS FOR CLEANING POLISHING SURFACE OF POLISHING APPARATUS
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机译:清洁抛光设备的设备抛光设备
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摘要
PROBLEM TO BE SOLVED: To provide an apparatus for cleaning the polishing surface of a polishing apparatus which prevents foreign particles removed from the polishing surface of a polishing table from being deposited and adhered to the inner wall of a cover that is attached in such a manner to surround injection nozzles of the polishing surface cleaning apparatus of atomizer system.;SOLUTION: The apparatus for cleaning the polishing surface of the polishing apparatus in which mixed fluids 14 comprising cleaning liquid and gas are injected from the injection nozzles 7-1 to 7-4 to the polishing surface of the polishing apparatus which presses an object to be polished to the polishing surface of the polishing table (top surface of a polishing cloth 2) to polish the object to be polished by relative motions of the polishing surface and the object to be polished, wherein a cover 12 is provided that surrounds a predetermined outer region ranging from front ends the injection nozzles to the polishing surface where the mixed fluids are injected, and a space adjustment mechanism 13 is provided for adjusting a space between the front end of the cover and the polishing surface.;COPYRIGHT: (C)2003,JPO
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