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APPARATUS FOR CLEANING POLISHING SURFACE OF POLISHING APPARATUS

机译:清洁抛光设备的设备抛光设备

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for cleaning the polishing surface of a polishing apparatus which prevents foreign particles removed from the polishing surface of a polishing table from being deposited and adhered to the inner wall of a cover that is attached in such a manner to surround injection nozzles of the polishing surface cleaning apparatus of atomizer system.;SOLUTION: The apparatus for cleaning the polishing surface of the polishing apparatus in which mixed fluids 14 comprising cleaning liquid and gas are injected from the injection nozzles 7-1 to 7-4 to the polishing surface of the polishing apparatus which presses an object to be polished to the polishing surface of the polishing table (top surface of a polishing cloth 2) to polish the object to be polished by relative motions of the polishing surface and the object to be polished, wherein a cover 12 is provided that surrounds a predetermined outer region ranging from front ends the injection nozzles to the polishing surface where the mixed fluids are injected, and a space adjustment mechanism 13 is provided for adjusting a space between the front end of the cover and the polishing surface.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种用于清洁抛光设备的抛光表面的设备,该设备防止从抛光台的抛光表面去除的异物沉积并附着在以这种方式连接的盖子的内壁上。解决方案:用于清洁抛光设备的抛光表面的设备,其中从喷嘴7-1至7-从喷嘴中注入包含清洁液和气体的混合流体14。如图4所示,在研磨装置的研磨面上,将被研磨物按压于研磨台的研磨面(研磨布2的上表面),通过该研磨面与被研磨物的相对运动来研磨被研磨物。进行抛光,其中设置有覆盖预定外部区域的盖12,该预定外部区域从喷嘴的前端到喷嘴注入混合流体的抛光表面,并提供一个空间调节机构13,用于调节盖子前端和抛光表面之间的空间。版权所有:(C)2003,JPO

著录项

  • 公开/公告号JP2003133277A

    专利类型

  • 公开/公告日2003-05-09

    原文格式PDF

  • 申请/专利权人 EBARA CORP;

    申请/专利号JP20010332710

  • 申请日2001-10-30

  • 分类号H01L21/304;B24B37/00;B24B55/06;

  • 国家 JP

  • 入库时间 2022-08-22 00:12:49

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