METHOD OF MAKING PATTERN FOR EXPOSURE, METHOD OF MAKING MASK FOR EXPOSURE, MASK FOR EXPOSURE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, PROGRAM FOR MAKING PATTERN FOR EXPOSURE, AND COMPUTER-READABLE RECORDING MEDIUM RECORDED WITH THE PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide a method of making a pattern for exposure which enables to automate the making of the pattern for exposure, to improve the quality of a mask to be formed with the pattern and of a semiconductor device where the pattern is transferred using the mask, and to provide a method of making a mask for exposure, the mask for exposure, a method of manufacturing the semiconductor device, the semiconductor device, a program for making the pattern for exposure, and a computer-readable recording medium recorded with the program. SOLUTION: A division-inhibiting region is set in a pattern for exposure formed as an opening on the mask for exposure. By determining that the length of a part 16c between patterns 16a and 16b, among the patterns lying outside of the division-inhibiting region, which should be an unopened section, is of a prescribed length or larger, the patterns 16a and 16b are divided. Thereafter, by proving that an angle on the opening 22a side formed of two sides which cross each other is the prescribed length or larger, a doughnut pattern 22 which includes this angle is divided.