Method for certifying a newly-made photomask

摘要

A method for certifying a newly-made photomask is disclosed. A wafer is provided first. Then, a pattern of a newly-made photomask is transferred onto the wafer in order to form a first pattern thereon, followed by transferring a pattern of an original photomask onto the wafer to form a second pattern. Subsequently, a comparison between the first pattern and the second pattern is made by using an optical inspector for examining the correctness of the newly-made photomask.