首页> 外国专利> Indium oxide powder, method for preparing the same, and method for manufacturing high-density indium tin oxide target

Indium oxide powder, method for preparing the same, and method for manufacturing high-density indium tin oxide target

机译:氧化铟粉末,其制备方法以及高密度氧化铟锡靶的制造方法

摘要

In2O3 powder, a method for preparing the In2O3 powder, and a method for manufacturing an indium tin oxide (ITO) target using the In2O3 powder. In the method for preparing the In2O3 powder, an alkaline precipitate is added to an indium solution having an indium ion concentration of about 2-5 M at a rate of about 0.5-4 L/min while the pH of the indium solution is adjusted to about 5-9, to form an In(OH)3 precipitate. Next, the precipitate is precipitated at a temperature of between about 600 to 1,100C. to produce the In2O3 powder. The In2O3 powder having a surface area of between about 5 to 18 m2/g and an average particle diameter of between about 40 to 160 nm is obtained. The In2O3 powder is applicable to form an ITO target for a high-quality, transparent electrode for a display, such as a liquid crystal display, electroluminescent display, or field emission display.
机译:In 2 O 3 粉体,In 2 O 3 粉体的制备方法及其制造方法In 2 O 3 粉末制成的铟锡氧化物(ITO)靶。在制备In 2 O 3 粉末的方法中,将碱性沉淀物以约2-5M的速率添加到具有约2-5M的铟离子浓度的铟溶液中。在将铟溶液的pH值调节至约5-9的同时,以约0.5-4 L / min的速度形成In(OH) 3 沉淀。接下来,沉淀物在约600至1100℃之间的温度下沉淀。产生In 2 O 3 粉末。 In 2 O 3 粉末的表面积约为5至18 m 2 / g,平均粒径约为40获得约160nm。 In 2 O 3 粉末可用于形成用于高质量透明电极的ITO靶,所述透明电极用于显示器,例如液晶显示器,电致发光显示器或场发射显示。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号