首页>
外国专利>
System for creating ultra-shallow dopant profiles
System for creating ultra-shallow dopant profiles
展开▼
机译:用于创建超浅掺杂剂分布图的系统
展开▼
页面导航
摘要
著录项
相似文献
摘要
A system for fabricating an integrated circuit having a gate is disclosed, in which high-density material (20) is deposited on a substrate (10) at or about a gate (30) and the adjacent lightly doped drain is implanted using high implantation energy through the high density material to create a shallow drain (50).
展开▼