Film forming method and film forming apparatus as well as silicon-based film, photovoltaic device and solar cell, sensor and image pick-up device using the same

摘要

A film, typically a silicon-based film, is formed on a substrate by means of a plasma CVD process using a high frequency wave in a condition where a resistance element made of a different material than that of the substrate is provided on the electric path between the substrate and the earth. The resultant film shows a high quality and an improved adhesion strength while it can be formed at a practically high rate.