首页> 外国专利> Manufacturing method of molecular film pattern, molecular film pattern, manufacturing method of semiconductor device, semicondctor device, manufacturing method of electro-optical device, electro-optical device, manufacturing method of electronic device, and electronic apparatus

Manufacturing method of molecular film pattern, molecular film pattern, manufacturing method of semiconductor device, semicondctor device, manufacturing method of electro-optical device, electro-optical device, manufacturing method of electronic device, and electronic apparatus

机译:分子膜图案的制造方法,分子膜图案,半导体装置,半导体装置的制造方法,电光装置的制造方法,电光装置,电子装置的制造方法以及电子设备

摘要

object A molecular film having various functional groups, which is formed on a substrate, can be easily patterned by ultraviolet light; however, patterning which can be performed in a more shorter time has been desired. ;solving Means An organic silane molecular film, having a thickness of 3 nm or less and an aromatic hydrocarbon group as a part of the molecular structure of the film, is formed on the surface of the substrate.
机译:目的可以容易地通过紫外线使形成在基板上的具有各种官能团的分子膜形成图案。然而,期望可以在更短的时间内执行的图案化。 ;解决手段:在基板的表面上形成有机硅烷分子膜,该有机硅烷分子膜的厚度为3nm或更小,并且芳香族烃基作为该膜的分子结构的一部分。

著录项

  • 公开/公告号US2002182890A1

    专利类型

  • 公开/公告日2002-12-05

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORPORATION;

    申请/专利号US20010026653

  • 发明设计人 MASAYA ISHIDA;TAKASHI MIYAZAWA;

    申请日2001-12-27

  • 分类号B05D3/00;

  • 国家 US

  • 入库时间 2022-08-22 00:08:04

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