首页> 外国专利> Transfer method, method of manufacturing thin film devices, method of manufacturing integrated circuits, circuit board and manufacturing method thereof, electro-optical apparatus and manufacturing method thereof, IC card, and elecronic appliance

Transfer method, method of manufacturing thin film devices, method of manufacturing integrated circuits, circuit board and manufacturing method thereof, electro-optical apparatus and manufacturing method thereof, IC card, and elecronic appliance

机译:转印方法,薄膜装置的制造方法,集成电路的制造方法,电路基板及其制造方法,电光装置及其制造方法,IC卡以及电子设备

摘要

A transfer method comprising a step of forming a plurality of transferred bodies on a transfer origin substrate, and a step of applying energy to partial regions corresponding to the transferred bodies to be transferred, and transferring these transferred bodies corresponding to the partial regions onto a transfer destination substrate. A plurality of transferred bodies such as devices or circuits that are to be disposed on a transfer destination substrate with spaces therebetween can be manufactured integrated together on a transfer origin substrate, and hence compared with the case that the transferred bodies are formed on the transfer destination substrate directly, the amount of materials used in the manufacture of the transferred bodies can be reduced, the area efficiency can be greatly improved, and a transfer destination substrate on which a large number of devices or circuits are disposed in scattered locations can be manufactured efficiently and cheaply.
机译:一种转印方法,包括以下步骤:在转印源基板上形成多个转印体;以及将能量施加到与要转印的转印体相对应的部分区域,并将这些与局部区域相对应的转印体转印到转印体上的步骤。目标基材。可以将要被放置在转移目的地基板上的诸如设备或电路之类的多个转移体在转移源基板上集成在一起制造,并且因此与在转移目的地上形成转移体的情况相比。直接制造基板,可以减少用于制造转印体的材料量,可以大大提高面积效率,并且可以有效地制造在分散的位置上布置有大量器件或电路的转印目标基板而且便宜。

著录项

  • 公开/公告号US2003022403A1

    专利类型

  • 公开/公告日2003-01-30

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORPORATION;

    申请/专利号US20020201268

  • 发明设计人 TATSUYA SHIMODA;SUMIO UTSUNOMIYA;

    申请日2002-07-24

  • 分类号H01L21/66;

  • 国家 US

  • 入库时间 2022-08-22 00:08:03

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