Arrangement for the suppression of particle emission in the generation of radiation based on hot plasma

摘要

The invention is directed to an arrangement for the suppression of particle emission in the generation of radiation based on hot plasma in x-ray radiation sources, particularly EUV radiation sources. The object of the invention, to find a novel possibility for debris filtering in plasma-coupled radiation sources which permits a reliable retention of charged and uncharged particles without substantially reducing transmission or limiting the usable solid angle of radiation, is met, according to the invention, by an arrangement for the suppression of particle emission with generation of radiation based on a hot plasma having a vacuum chamber for generating the plasma in that the outlet opening of the vacuum chamber is followed by means for generating an electric field, wherein the electric field is oriented orthogonal to the central propagation direction of a divergent beam bundle exiting in a defined solid angle, and means for generating a gas sink so that a resulting particle flow is oriented parallel to the direction of the electric field. The particle flow is advantageously further reinforced in the direction of the gas sink by an oppositely arranged gas supply device.