Acoustic/ultrasonic agitation to reduce microbubbles in developer

摘要

The present invention relates to a method of eliminating microbubbles associated with a developer solution. The method includes depositing the developer solution over an exposed photoresist film which overlies a substrate and agitating the developer solution using waves. The agitation of the developer solution causes the microbubbles to exit the developer solution and reduces defects previously associated therewith. In addition, a system for eliminating microbubbles associated with a developer solution is disclosed. The system includes an apparatus for applying the developer solution to a photoresist film which overlies a substrate and a developer agitation system. The developer agitation system is operably coupled to the developer solution and agitates the developer solution using waves, which causes the microbubbles to exit the developer solution.