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Method and apparatus for compensating for ionizing radiation induced threshold shift in metal oxide semiconductor field effect transistors

机译:补偿金属氧化物半导体场效应晶体管中的电离辐射引起的阈值偏移的方法和装置

摘要

A compensation circuit and method for compensating for the threshold shift in an irradiated MOSFET. The method determines the gate threshold voltage to body voltage relationship to vary the body voltage with radiation. The compensation circuit (10) has at least one MOSFET (Q2) having the same channel type as the MOSFET being compensated (Q1). The at least one matching MOSFET (Q2) is connected to the gate of the MOSFET (Q1) being compensated. At least one MOSFET (Q3, Q4) having a channel type that is different from the channel type of the MOSFET (Q1) being compensated is connected to the gate of the matching MOSFET (Q2). The result is that the compensation circuit (10) controls a negative shift in the body voltage of the MOSFET (Q1) being compensated resulting in a higher threshold voltage.
机译:一种补偿电路和方法,用于补偿辐照MOSFET中的阈值偏移。该方法确定栅极阈值电压与体电压的关系,以随辐射改变体电压。补偿电路( 10 )具有至少一个与被补偿MOSFET(Q 1 )具有相同沟道类型的MOSFET(Q 2 ) 。至少一个匹配的MOSFET(Q 2 )连接到要补偿的MOSFET(Q 1 )的栅极。至少一个沟道类型与MOSFET的沟道类型(Q 1 )不同的MOSFET(Q 3 ,Q 4 )被补偿的电阻连接到匹配MOSFET(Q 2 )的栅极。结果是,补偿电路( 10 )控制要补偿的MOSFET(Q 1 )的体电压的负移,从而导致更高的阈值电压。

著录项

  • 公开/公告号US6600241B2

    专利类型

  • 公开/公告日2003-07-29

    原文格式PDF

  • 申请/专利权人 THE BOEING COMPANY;

    申请/专利号US20020226381

  • 发明设计人 LARRY M. TICHAUER;STEVEN S. MCCLURE;

    申请日2002-08-23

  • 分类号H05B370/20;

  • 国家 US

  • 入库时间 2022-08-22 00:05:22

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