PHOTOLITHOGRAPHIC METHODS FOR MAKING LIQUID-CRYSTAL-ON-SILICON DISPLAYS WITH ALIGNMENT POSTS AND OPTICAL INTERFERENCE LAYERS

摘要

Five new methods for the formation of an improvedliquid-crystal-on-silicon display are described, in whichthe device structure is enhanced by the photolithographicbuilding of alignment posts among the mirror pixels of themicro-display. These five methods accommodate thefabrication of an optical interference multilayer, whichimproves the image quality of the reflected light. Thesefive methods are:Silicon Dioxide Posts by Wet Etching.Amorphous Silicon Posts by Plasma Etching.Silicon Nitride Posts by Plug Filling.Insulation Material Posts by Lift-off.Polyimide Posts by Photosensitive Etching.