Photolithographic methods for making liquid-crystal-on-silicon displays with alignment posts and optical interference layers

摘要

Five new methods for the formation of an improved liquid-crystal-on-silicon display are described, in which the device structure is enhanced by the photolithographic building of alignment posts among the mirror pixels of the micro-display. These five methods accommodate the fabrication of an optical interference multilayer, which improves the image quality of the reflected light. These five methods are:;Silicon Dioxide Posts by Wet Etching.;Amorphous Silicon Posts by Plasma Etching.;Silicon Nitride Posts by Plug Filling.;Insulation Material Posts by Lift-off.;Polyimide Posts by Photosensitive Etching.