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.... A magnetic random access memory to use diode fabricated by MILC metal-induced lateral crystallization and a method for the same

机译:....使用通过MILC金属诱导的横向结晶制造的二极管的磁性随机存取存储器及其方法

摘要

PURPOSE: A magnetic RAM utilizing a diode by using a metal-induced lateral crystallization(MILC) and a method for forming the same are provided to reduce the temperature used in the process of diode formation, thereby allowing the diode to be formed after the MJT cell is processed. CONSTITUTION: A magnetic RAM utilizing a diode by using a metal-induced lateral crystallization(MILC) includes a semiconductor substrate(51), a wordline(53) formed on an active area of the semiconductor substrate(51), an MTJ cell(55) formed on top of the wordline(53), a diode(67) connected to the MTJ cell(55) by using the MILC method and a bit line(69) connected to the diode(67). In the magnetic RAM, the diode(67) includes an N+ polysilicon layer(61) and a P+ polysilicon layer(66). The N+ polysilicon layer(61) is obtained by annealing the N+ amorphous silicon layer at a temperature ranging from 100 C to 450 C. And, the P+ polysilicon layer(66) is obtained by annealing the P+ amorphous silicon layer at a temperature ranging from 100 C to 450 C.
机译:目的:提供一种通过利用金属诱导的横向结晶(MILC)利用二极管的磁性RAM及其形成方法,以降低二极管形成过程中使用的温度,从而允许在MJT之后形成二极管单元已处理。组成:一种利用金属诱导横向结晶(MILC)利用二极管的磁性RAM,包括半导体衬底(51),形成在半导体衬底(51)有源区域上的字线(53),MTJ单元(55) )形成在字线(53)的顶部,二极管(67)通过使用MILC方法连接到MTJ单元(55),并且位线(69)连接到二极管(67)。在磁性RAM中,二极管(67)包括N +多晶硅层(61)和P +多晶硅层(66)。通过在100℃至450℃的温度范围内对N +非晶硅层进行退火,可以得到N +多晶硅层(61)。并且,可以通过将P +非晶态硅层在200至450°C的温度范围内进行退火来获得P +多晶硅层(66)。 100 C至450C。

著录项

  • 公开/公告号KR20030073371A

    专利类型

  • 公开/公告日2003-09-19

    原文格式PDF

  • 申请/专利权人 HYNIX SEMICONDUCTOR INC.;

    申请/专利号KR20020012904

  • 发明设计人 JANG IN U;KIM CHANG SEOK;KYUNG HUI;

    申请日2002-03-11

  • 分类号G11C11/15;

  • 国家 KR

  • 入库时间 2022-08-21 23:46:15

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