Device for galvanically surface treating workpieces comprises a process chamber having feed openings for introducing process liquid and waste openings for removing process liquid arranged in groups at a distance from the surface

摘要

Device for galvanically surface treating workpieces comprises a process chamber (20) for the workpieces and having feed openings (22) for introducing process liquid and waste openings (26) for removing process liquid. The feed and waste openings are arranged in groups at a distance from the surface to be treated. An electrode (40) is connected to a current source and the workpiece is connected as counter electrode to a current source of opposing polarity. An Independent claim is also included for a process for galvanically surface treating workpieces. Preferably the electrode is formed as part of a longitudinally extending hollow body and forms a separating wall between a feed channel and a removal channel.