Device for removing a substrate from a treatment chamber filled with a treating liquid used in galvanic surface treatment comprises a unit for producing relative movement between the substrate and liquid meniscus

摘要

Device for removing a substrate from a treatment chamber filled with a treating liquid comprises a unit for producing relative movement between the substrate and liquid meniscus so that the excess treating liquid adhered to the substrate is minimized after the substrate leaves the chamber. Preferred Features: The relative movement is produced by a unit for lifting the substrate from the chamber, a unit for bleeding or pumping out the treating liquid, a unit for lowering the chamber relative to the substrate or a combination of these units.