Inline vacuum deposition device used for treating substrates has a buffer chamber having an inlet side and an outlet side in the region of a discontinuous transport

摘要

Inline vacuum deposition device has a buffer chamber (13) having an inlet side (14) and an outlet side (15) in the region of a discontinuous transport (6). The chamber has an exchange unit (16) for receiving carrier supports (3) which rotate about a vertical rotary axis. At least two carrier receiving pods (17) are also provided which are arranged on the sides of a horizontal corner virtually lying central to the vertical rotary axis. Preferred Features: The exchange unit is directly driven by a linear motor on the inner buffer chamber base about the vertical axis. Each carrier receiving pod is equipped with a transport device for receiving and/or releasing the carrier support.