首页> 外国专利> METHOD FOR MANUFACTURING NITRIDE CRYSTAL OF GROUP III ELEMENT, NITRIDE CRYSTAL OF GROUP III ELEMENT OBTAINED BY THE SAME, AND SEMICONDUCTOR DEVICE OBTAINED BY USING THE SAME

METHOD FOR MANUFACTURING NITRIDE CRYSTAL OF GROUP III ELEMENT, NITRIDE CRYSTAL OF GROUP III ELEMENT OBTAINED BY THE SAME, AND SEMICONDUCTOR DEVICE OBTAINED BY USING THE SAME

机译:制造同一族获得的第三族元素的氮化物晶体,第三族元素的氮化物晶体以及通过使用该第三族元素的氮化物晶体获得的方法

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a nitride crystal of a group III element by which the carrier concentration can be easily controlled, the nitride crystal of the group III element obtained by the method, and a semiconductor device obtained by using the nitride crystal.;SOLUTION: The method for manufacturing the nitride crystal of the group III element includes a process for growing the crystal by reacting the group III element, nitrogen and a dopant in a melt containing an alkali metal in an atmosphere of a gas containing the nitrogen-containing gas and the dopant. As the group III element, at least one selected from, for example, Ga, Al and In can be used.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种用于制造能够容易地控制载流子浓度的III族元素的氮化物晶体的方法,通过该方法获得的III族元素的氮化物晶体以及通过使用该方法获得的半导体器件。氮化物晶体;解决方案:用于制造第三族元素的氮化物晶体的方法包括通过使第三族元素,氮和掺杂剂在含碱金属的熔体中,在含有气体的气氛中反应来生长晶体的工艺。含氮气体和掺杂剂。作为III族元素,可以使用选自例如Ga,Al和In中的至少一种。版权所有:(C)2005,JPO&NCIPI

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