首页> 外国专利> METHODS FOR SETTING HIGH VOLTAGE TRIMMING VALUE AND TIME TRIMMING VALUE FOR NONVOLATILE MEMORY, INSPECTION EQUIPMENT FOR NONVOLATILE MEMORY, AND NONVOLATILE MEMORY

METHODS FOR SETTING HIGH VOLTAGE TRIMMING VALUE AND TIME TRIMMING VALUE FOR NONVOLATILE MEMORY, INSPECTION EQUIPMENT FOR NONVOLATILE MEMORY, AND NONVOLATILE MEMORY

机译:设置非易失性存储器的高压调整值和时间调整值的方法,非易失性存储器的检查设备以及非易失性存储器

摘要

PPROBLEM TO BE SOLVED: To provide a method for setting a high voltage trimming value for a nonvolatile storage for improving reliability life of the nonvolatile storage by relieving an electric stress to a memory cell transistor. PSOLUTION: First, by the design profile of a writing high voltage, a first writing high voltage trimming value based on the design standard is decided (step S201), data are written by a voltage following the first writing high voltage trimming value (step S202), and the threshold voltage of the memory cell transistor after writing is measured (step S203). Then, by the measured threshold voltage, the threshold voltage, and the trimming profile for the writing high voltage, a second writing high voltage trimming value optimum for making the threshold voltage coincide with a target value (the minimally required threshold voltage after data writing) is determined (step S204). PCOPYRIGHT: (C)2004,JPO
机译:

要解决的问题:提供一种为非易失性存储器设置高电压修整值的方法,以通过减轻对存储单元晶体管的电应力来改善非易失性存储器的可靠性寿命。

解决方案:首先,通过写入高电压的设计轮廓,基于设计标准确定第一写入高电压微调值(步骤S201),通过跟随第一写入高电压微调值的电压写入数据。 (步骤S202),测量写入后的存储单元晶体管的阈值电压(步骤S203)。然后,通过测量的阈值电压,阈值电压和用于写入高电压的修整曲线,第二写入高电压修整值最适于使阈值电压与目标值一致(数据写入后的最低要求阈值电压)确定(步骤S204)。

版权:(C)2004,日本特许厅

著录项

  • 公开/公告号JP2004087053A

    专利类型

  • 公开/公告日2004-03-18

    原文格式PDF

  • 申请/专利权人 MATSUSHITA ELECTRIC IND CO LTD;

    申请/专利号JP20020249834

  • 发明设计人 MISUMI KENJI;

    申请日2002-08-29

  • 分类号G11C16/06;G11C16/02;G11C29/00;H01L21/66;H01L21/8247;H01L27/115;H01L29/788;H01L29/792;

  • 国家 JP

  • 入库时间 2022-08-21 23:34:08

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