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Achieving high mobility low-voltage operating organic field-effect transistor nonvolatile memory by an ultraviolet-ozone treating ferroelectric terpolymer

机译:通过紫外线臭氧处理铁电三元共聚物实现高迁移率低压工作的有机场效应晶体管非易失性存储器

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摘要

Poly(vinylidene fluoride–trifluoroethylene) has been widely used as a dielectric of the ferroelectric organic field-effect transistor (FE-OFET) nonvolatile memory (NVM). Some critical issues, including low mobility and high operation voltage, existed in these FE-OFET NVMs, should be resolved before considering to their commercial application. In this paper, we demonstrated low-voltage operating FE-OFET NVMs based on a ferroelectric terpolymer poly(vinylidene-fluoride-trifluoroethylene-chlorotrifluoroethylene) [P(VDF-TrFE-CTFE)] owed to its low coercive field. By applying an ultraviolet-ozone (UVO) treatment to modify the surface of P(VDF-TrFE-CTFE) films, the growth model of the pentacene film was changed, which improved the pentacene grain size and the interface morphology of the pentacene/P(VDF-TrFE-CTFE). Thus, the mobility of the FE-OFET was significantly improved. As a result, a high performance FE-OFET NVM, with a high mobility of 0.8 cm2 V−1 s−1, large memory window of 15.4~19.2, good memory on/off ratio of 103, the reliable memory endurance over 100 cycles and stable memory retention ability, was achieved at a low operation voltage of ±15 V.
机译:聚偏二氟乙烯-三氟乙烯已被广泛用作铁电有机场效应晶体管(FE-OFET)非易失性存储器(NVM)的电介质。这些FE-OFET NVM中存在一些关键问题,包括低迁移率和高工作电压,应在考虑其商业应用之前加以解决。在本文中,由于低矫顽场,我们展示了基于铁电三元共聚物聚(偏二氟乙烯-三氟乙烯-氯三氟乙烯)[P(VDF-TrFE-CTFE)]的低压工作FE-OFET NVM。通过应用紫外线臭氧处理来修饰P(VDF-TrFE-CTFE)薄膜的表面,改变了并五苯薄膜的生长模型,从而改善了并五苯的晶粒尺寸和并五苯/ P的界面形态(VDF-TrFE-CTFE)。因此,FE-OFET的迁移率显着提高。结果,高性能FE-OFET NVM具有0.8 mobilitycm 2 V -1up s -1 的高迁移率,并且内存大在±15 V的低工作电压下,可以实现15.4〜19.2的窗口范围,良好的内存开/关比10 3 ,在100个周期内具有可靠的内存持久性以及稳定的内存保持能力。

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