PROBLEM TO BE SOLVED: To provide a thin film manufacturing apparatus and method that can stabilize the properties of a thin film obtained.;SOLUTION: A raw material vessel 13 is provided that prepares source gas by bubbling carrier-gas on a raw material 10 for a thin film which is liquid in a working state. A deposition chamber 61 is provided for forming a thin film on a substrate by force of reaction out of the source gas obtained and introduced from the raw material vessel 13. A first pressure sensor 21 and a second pressure sensor 22 are provided, respectively, for both of an upstream and a downstream side in the carrier-gas flow channel for the raw material vessel 13. A pressure adjustment valve 20 is provided for adjusting the flow rate of the source gas placed on the downstream side. A controller 23 is provided that controls the pressure adjustment valve 20, based on respective values measured by the first and second pressure sensors 21 and 22.;COPYRIGHT: (C)2004,JPO
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