ADDITIVE FOR PHOTORESIST AND PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide an additive for a photoresist having excellent transparency for ArF excimer light and improves the resolution, dry etching property and sensitivity, and to provide a photoresist composition.;SOLUTION: The additive for a photoresist comprises a compound expressed by general formula (I) and/or a compound expressed by general formula (II). The additive for a photoresist is a chemically amplified photoresist composition with, as essential components, a polymer which changes into alkali-soluble by the effect of an acid, a compound which generates an acid by the effect of light, and a solvent which dissolves them. The additive for a photoresist and the photoresist composition obtained by using the same are useful particularly for ArF excimer light.;COPYRIGHT: (C)2004,JPO