The bright peak transparent phase shift mask and its use method of being reinforced

摘要

X-ray lithography using, it includes the membrane where especially the transparent phase shift mask which is applied almost has the even apex aspect and the bottom aspect in order to draw the nano- structure, the said membrane almost is permeability vis-a-vis the lighting which incidence is done. In addition, the mask includes the phase shift territory of the pair which is supported in the said membrane, each territory demarcates the end which corresponds. At the time of picture operation, the mask forms the aerial image which demarcates with end bright peak and end dark peak vis-a-vis each end where it corresponds. End bright peak causes structural interference by selecting width appropriately in the mask, forms the picture bright peak where strength was reinforced. Following to another execution form, the phase shift material which is supported by the membrane is offered. The phase shift material as two pair phases the end where it opposes is included, demarcates the aperture where it is alienated by the vertical distance to which each opposite corresponds, the said vertical distance is selected in order for structural interference of end bright peak to be reinforced in order to form the picture bright peak where the strength which is used in order to draw two dimensional fee char was reinforced.