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Non-volatile floating gate memory cell with floating gates formed in cavities, and array thereof, and method of formation

机译:具有在腔中形成的浮置栅极的非易失性浮置栅极存储单元及其阵列以及形成方法

摘要

A non-volatile memory cell has a single crystalline semiconductive material, such as single crystalline silicon, of a first conductivity type. A first and a second region each of a second conductivity type, different from the first conductivity type, spaced apart from one another is formed in the semiconductive material. A channel region, having a first portion, and a second portion, connects the first and second regions for the conduction of charges. A dielectric is on the channel region. A floating gate, which can be conductive or non-conductive, is on the dielectric, spaced apart from the first portion of the channel region. The first portion of the channel region is adjacent to the first region, with the first floating gate having generally a triangular shape. The floating gate is formed in a cavity. A gate electrode is capacitively coupled to the first floating gate, and is spaced apart from the second portion of the channel region. The second portion of the channel region is between the first portion and the second region. A bi-directional non-volatile memory cell has two floating gates each formed in a cavity. A method of making the non-volatile memory cell and the array are also disclosed.
机译:非易失性存储单元具有第一导电类型的单晶半导体材料,例如单晶硅。在半导体材料中形成彼此间隔开的与第一导电类型不同的第二导电类型的第一区域和第二区域。具有第一部分和第二部分的沟道区域连接第一区域和第二区域以进行电荷传导。电介质在沟道区上。可以是导电的或不导电的浮栅在电介质上,与沟道区的第一部分间隔开。沟道区域的第一部分与第一区域相邻,第一浮置栅极具有大致三角形的形状。浮置栅极形成在空腔中。栅电极电容耦合到第一浮栅,并且与沟道区的第二部分间隔开。沟道区域的第二部分在第一部分和第二区域之间。双向非易失性存储单元具有两个浮栅,每个浮栅形成在空腔中。还公开了制造非易失性存储单元和阵列的方法。

著录项

  • 公开/公告号US6806531B1

    专利类型

  • 公开/公告日2004-10-19

    原文格式PDF

  • 申请/专利权人 SILICON STORAGE TECHNOLOGY INC.;

    申请/专利号US20030409248

  • 发明设计人 BOMY CHEN;BING YEH;DANA LEE;

    申请日2003-04-07

  • 分类号H01L297/88;

  • 国家 US

  • 入库时间 2022-08-21 23:19:50

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