Selective deposition of hydrous ruthenium oxide thin films

摘要

A method for selectively depositing a film of hydrous ruthenium oxide on a substrate, the method comprising the steps of:;selectively functionalizing a substrate surface;;preparing an oxidizing aqueous solution of a Ru-containing composition;;generating RuO₄(g) from said oxidizing solution;;selectively depositing a film of hydrous ruthenium oxide from said vapor of said oxidizing solution on said functionalized surface of said substrate; and;depositing by autocatalysis hydrous ruthenium oxide from said vapor of said oxidizing solution on said previously deposited hydrous ruthenium oxide. RuO₂.xH₂O films are uniformly deposited on substrates that have been selectively surface-modified with or already contain the RuO₄-reactive functional groups.