METHOD AND DEVICE FOR ELIMINATING OXIDE(S) PRESENT ON THE SURFACE OF A METAL MATERIAL AND FOR RESTORING AN OXIDE LAYER OF SAID SURFACE

摘要

The invention concerns a method and device for eliminating oxides present on the surface of a metal material and for restoring an oxide layer on said surface which consists in: immersing said material in a gas medium which has a reducing effect on oxides initially present on the surface of said material during the cold plasma etching phase, and an oxidizing effect on the exposed surface of said material during a post-discharge phase; generating a cold plasma around said material to eliminate said oxides initially present on its surface; and generating a temporal or spatial post-discharge around said material to restore an oxide layer on its surface. The invention also concerns a device for implementing said method.