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ARRANGEMENT FOR DETERMINING VARIATIONS IN LAYER THICKNESS

机译:确定层厚变化的安排

摘要

The invention relates to an arrangement for determining variations in the layer thickness of a sample (4) by means of reflectrometric interference spectroscopy, said arrangement comprising a light source (1) for illuminating the sample (4), a sample holding element (5) for fixing the sample (4), and an evaluation unit (6) for analysing the light reflected by the sample (4). One such arrangement is provided with a first light guide (7) comprising a light output surface (9) for the transmission of the light from the light source (1) to the sample (4), and with a second light guide (8) comprising a light admission surface (10) for the transmission of the light reflected by the sample (4) to the evaluation unit (6).
机译:本发明涉及一种用于通过反射光谱法确定样品(4)的层厚变化的装置,所述装置包括用于照亮样品(4)的光源(1),样品保持元件(5)。固定样品(4)的单元,以及用于分析样品(4)反射的光的评估单元(6)。一个这样的装置设置有第一光导(7),第二光导(8)包括用于将光从光源(1)传输到样品(4)的光输出表面(9)。包括光入射表面(10),用于将样品(4)反射的光传输到评估单元(6)。

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