首页> 外国专利> Radiation-generating devices utilizing multiple plasma-discharge sources and microlithography apparatus and methods utilizing the same

Radiation-generating devices utilizing multiple plasma-discharge sources and microlithography apparatus and methods utilizing the same

机译:利用多个等离子体放电源的放射线产生装置以及使用其的微光刻装置和方法

摘要

Radiation-generating devices are disclosed that are suitable for use in a microlilhography apparatus. The devices utilize multiple plasma-discharge radiation sources (e.g., capillary discharge X-ray sources) and produce a high output with a high repeat frequency while minimizing the thermal loads to which the individual radiation sources are subjected. In one embodiment, multiple radiation sources (discharge units) are coupled to a movable substrate, such as a rotary plate. The movable substrate can be controlled such that a selected one of the multiple discharge units can be moved into a discharge position and aligned along a discharge axis. The device may also include a preliminary-ionization source facing the discharge axis. Alternatively, multiple preliminary4onization sources may be coupled to the movable substrate such that a selected one of the preliminary ionization sources energizes the target gas in the selected discharge unit.
机译:公开了适于在微光刻设备中使用的放射线产生装置。该设备利用多个等离子体放电辐射源(例如,毛细管放电X射线源),并以高重复频率产生高输出,同时使各个辐射源所承受的热负荷最小。在一实施例中,多个辐射源(放电单元)耦合至可移动基板,例如旋转板。可以控制可动基板,使得可以将多个排出单元中的选定一个移至排出位置并沿着排出轴对准。该装置还可包括面向放电轴的预电离源。或者,可以将多个预电离源耦合到可移动基板,以使预选电离源中的选定一个为选定的放电单元中的目标气体供能。

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