LITHOGRAPHY PROJECTION SYSTEM COMPRISING GAS FLUSHING SYSTEM, PREPARATION METHOD OF DEVICE USING THE LITHOGRAPHY PROJECTION SYSTEM AND DEVICE PREPARED BY THE METHOD TO REDUCE ABSORPTION OF PROJECTED BEAM BY WATER ON RESIST

摘要

PURPOSE: Provided are a lithography projection apparatus comprising a gas flushing system, a method for preparing a device by using the apparatus and a device prepared by the method to reduce the absorption of projected beam by the water on a resist by removing some water from the resist before the projected beam reaches the surface of the resist on a substrate. CONSTITUTION: The lithography projection apparatus comprises a radiation system which provides the projected beam of radiation; a supporting structure which supports the patterning means patterning the projected beam according to a desired pattern; a substrate table(WT) which holds a substrate(W); a projection system which projects the patterned beam on the target zone of the substrate; and a gas flushing system(200), wherein the gas flushing system and the substrate form a middle space between them for radial direction gas flow(203), the gas flushing system has an outflow hole(202) for producing the radial direction gas flow, and the radial direction gas flow is disposed so as to the radial direction gas flow in use for allowing the radial direction gas flow to have a outward radial direction velocity at all positions in space.