METHOD FOR MANUFACTURING FIELD EMISSION DEVICE FOR MINIMIZING DAMAGES ON A TUNNEL OXIDE FILM BY FORMING THE TUNNEL OXIDE FILM IN THE LATTER HALF OF PROCESS

摘要

PURPOSE: A method is provided to achieve improved operating reliability of a field emission device and lengthen the useful life of the field emission device by minimizing the damages on a tunnel oxide film due to formation of a lower plate. CONSTITUTION: A method comprises a step of protecting a certain part of the top of a lower electrode where a tunnel oxide film is to be formed, by using a thin film hard mask(13) formed at the center of the top of the lower electrode and a photoresist(PR) used in the process of etching the thin film hard mask; and a step of removing the thin film hard mask and the photoresist prior to formation of a top electrode, and forming a tunnel oxide film on the exposed lower electrode.