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METHOD FOR FORMING FLAT INDIUM TIN OXIDE LAYER ON SUBSTRATE, SUBSTRATE COATING AND ORGANIC LIGHT EMITTING DIODE OF INDIUM TIN OXIDE
METHOD FOR FORMING FLAT INDIUM TIN OXIDE LAYER ON SUBSTRATE, SUBSTRATE COATING AND ORGANIC LIGHT EMITTING DIODE OF INDIUM TIN OXIDE
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机译:在基质,基质涂层和氧化铟锡的有机发光二极管上形成平坦的氧化铟锡层的方法
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摘要
PROBLEM TO BE SOLVED: To enable to generate a flat metal oxide layer, especially a flat ITO layer on a substrate in a simple and economical mode.;SOLUTION: In order to especially form an organic light emitting diode, in a method for forming the ITO layer on the substrate, a part of a thickness of the ITO layer is firstly given by a sputter-deposition at a controlled temperature profile in such a mode that formation of a crystal nucleus may be prevented. After that, the partially coated substrate is heated up to a higher temperature than the recrystallization temperature of the ITO layer, and the remaining part of the ITO layer is sputter-deposited.;COPYRIGHT: (C)2005,JPO&NCIPI
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