首页> 外国专利> PLASMA DENSITY INFORMATION MEASURING PROBE, PLASMA DENSITY INFORMATION MEASURING DEVICE, AND PLASMA PROCESSING DEVICE

PLASMA DENSITY INFORMATION MEASURING PROBE, PLASMA DENSITY INFORMATION MEASURING DEVICE, AND PLASMA PROCESSING DEVICE

机译:等离子体密度信息测量探头,等离子体密度信息测量设备和等离子体处理设备

摘要

PROBLEM TO BE SOLVED: To obtain plasma density more precisely by improving measuring precision of an absorption frequency by the plasma.;SOLUTION: On a measuring probe to be inserted into a plasma PM, an external conductor 43c of a coaxial cable 43 inserted into a tube 41 which is an dielectrics is grounded at the outside of a chamber 10, and a circular noise reduction element (ferrite core) 50 is passed through the coaxial cable 43 between its grounded site 49 and an antenna 42. By this, noise components picked up by the antenna 42 and transferred through the coaxial cable 43 are reduced, and an S/N ratio of a reflective power signal generated by the plasma PM as an object to be measured can be improved.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:通过提高等离子体对吸收频率的测量精度来更精确地获得等离子体密度。解决方案:在要插入等离子体PM中的测量探头上,同轴电缆43的外部导体43c插入到等离子体PM中。作为电介质的管41在腔室10的外部接地,并且圆形的降噪元件(铁氧体磁心)50通过同轴电缆43在其接地部位49和天线42之间。由此,噪声成分被拾取。降低了天线42向上传输并通过同轴电缆43传输的信号,可以提高等离子体PM作为待测对象产生的反射功率信号的信噪比(S / N).;版权所有:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2005135746A

    专利类型

  • 公开/公告日2005-05-26

    原文格式PDF

  • 申请/专利权人 TOKYO ELECTRON LTD;NISSHIN:KK;

    申请/专利号JP20030370595

  • 发明设计人 TOYODA NAOKI;NITTA HITOSHI;

    申请日2003-10-30

  • 分类号H05H1/00;C23C16/50;H01L21/3065;H05H1/46;

  • 国家 JP

  • 入库时间 2022-08-21 22:34:57

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