METHOD FOR DIFFUSING DOPANT INTO SEMICONDUCTOR SUBSTRATE FROM SOLID DOPANT SOURCE

摘要

PROBLEM TO BE SOLVED: To provide a method for diffusing a dopant into a semiconductor substrate from a solid dopant source capable of making a diffused dopant amount uniform in the diffusion of the dopant into the semiconductor substrate.;SOLUTION: One through-hole is formed in a disk-shaped solid dopant source, so that, when gas is introduced through a gas inlet port of a diffusion tube, the introduced gas also flows from the one through-hole formed in the solid dopant source.;COPYRIGHT: (C)2005,JPO&NCIPI