DESIGN OF GAS DIFFUSION SHOWER HEAD FOR LARGE-AREA PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION

摘要

PPROBLEM TO BE SOLVED: To provide an improved gas distribution plate for distributing gas in a processing chamber. PSOLUTION: A gas distribution plate includes a diffusion plate, having an upstream side and a downstream side, and a plurality of gas channels running between the upstream side and the downstream side. At least one of the gas channels has a cylindrical shape of a longitudinal part of the channel extending from the upstream side and a coaxial, conical shape of the longitudinal remainder of the diffusion plate, wherein the diameter at the upstream end of the conical portion is approximately equal to the diameter of the straight cylindrical portion, and the diameter at the downstream end of the conical portion is larger than that. The gas distribution plate is manufactured comparatively easily and has high chamber cleaning speed, superior uniformity of thin-film deposition, and high thin-film deposition speed. Moreover, the gas diffusion plate has the advantages of reduction in the chamber cleaning residues and of reduction in the mixing of cleaning residues within a thin film deposited. PCOPYRIGHT: (C)2006,JPO&NCIPI