METHOD FOR GENERATING REFERENCE IMAGE AND INSPECTION APPARATUS FOR PHASE SHIFT PHOTOMASK

摘要

PPROBLEM TO BE SOLVED: To increase the coincidence degree between a reference image and a real image to eliminate a pseudo defect and to improve inspection accuracy by increasing the accuracy of generating a reference image and controlling the luminosity setting on real inspection to be coincident with the luminosity setting for the reference image. PSOLUTION: By the conventional method, an image is generated along operational lines 74, 76 and values between the minimum gradation Rmin and 0 are matched with an image for inspection. However, in this invention, when the luminosity of a pixel is higher than Rmin, the operational line 74 is selected, while the operational line 75 is selected, when the luminosity is lower than Rmin. This improves the accuracy for generating a reference image. PCOPYRIGHT: (C)2005,JPO&NCIPI