METHOD FOR REFERENCE IMAGE GENERATING ON SUBSTRATE, METHOD FOR INSPECTION OF DEFECTS ON SUBSTRATE, APPARATUS FOR REFERENCE IMAGE GENERATING ON SUBSTRATE, UNIT FOR INSPECTION OF DEFECTS ON SUBSTRATE AND COMPUTER-READABLE RECORDING MEDIUM

摘要

The objective of the present invention is to properly generate the reference image of a substrate and to properly inspect the defects of the substrate. The present invention relates to a method of generating the image of a wafer which is the reference of defect inspection, based on photographed substrate images after the wafer is photographed. The present invention includes a component separation process of separating the plane distribution Z of a pixel value in the photographed substrate images into pixel value distribution components by using a Zernike polynomial expression according to the substrate images, a Zernike index calculation process of calculating the Zernike index of each pixel value distribution component separated by the Zernike polynomial expression, a Zernike index calculation process of extracting a value which has a gap between each calculated Zernike index and a center value (1) and a preset value or more (2) from the center value according to a Zernike index having the same dimension, an image speciation process of specifying each substrate image having the extracted value, and an image generation process of generating the image of the wafer which is the reference of the defect inspection by mixing the specific substrate images.