METHOD FOR REFERENCE IMAGE GENERATING ON SUBSTRATE METHOD FOR INSPECTION OF DEFECTS ON SUBSTRATE APPARATUS FOR REFERENCE IMAGE GENERATING ON SUBSTRATE UNIT FOR INSPECTION OF DEFECTS ON SUBSTRATE AND COMPUTER-READABLE RECORDING MEDIUM

摘要

An object of the present invention is to create a reference image of an appropriate substrate and appropriately inspect the substrate for defects. A method for generating an image of a wafer as a reference for defect inspection based on a plurality of picked-up image of a plurality of substrates, the method comprising the steps of: calculating a plane distribution Z of pixel values in a picked-up substrate image as a Zernike polynomial A Zernike coefficient calculating step of calculating a Zernike coefficient of each of the pixel value distribution components decomposed by the Zernike polynomial, and a Zernike coefficient calculating step of calculating a Zernike coefficient of each of the pixel value distribution components, (1) a median value for each of the Zernike coefficients having the same degree from the Zernike coefficient, and (2) a Zernike coefficient extraction step for extracting a value deviated by a predetermined value or more from the median value, An image specifying step of specifying an image and an image of a wafer serving as a reference of defect inspection by combining the specified substrate images And an image creating step of creating the image.