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Optical multi-beam scanning device and image forming apparatus

机译:光学多光束扫描装置和图像形成装置

摘要

When a rear position on an excessive light emitting surface of an optical path synthesizing optical part for guiding a plurality of beams to one deflecting surface does not have a sufficient space, an optical multi-beam scanning device and an image forming apparatus of the present invention prevent excessive light from becoming stray light and exerting a bad effect on light sources and the other optical parts. The optical multi-beam scanning device of the present invention has a plurality of pre-deflection optical units, an optical path synthesizing member and an excessive light processing member. The pre-deflection optical units give predetermined properties to the light beams from the light sources. The optical path synthesizing member aligns optical paths of the light beams from all or some of the light sources in a horizontal scanning direction when the pre-deflection optical units give the predetermined properties to the light beams or while giving them to the light beams. The excessive light processing member processes excessive light emitted from an excessive light emitting surface which is not an incident surface nor an emitting surface of the optical path synthesizing member. The excessive light processing member has a multi-stage taper constitution with a plurality of taper surface having different tilt angles, an absorbing surface roughly parallel with the excessive light emitting surface for absorbing the excessive light emitted from the excessive light emitting surface, or repeated local patterns for dispersing the excessive light emitted from the excessive light emitting surface.
机译:当用于将多个光束引导到一个偏转表面的光路合成光学部件的过剩发光表面上的后部位置没有足够的空间时,本发明的光学多光束扫描装置和图像形成装置防止过多的光变成杂散光,并对光源和其他光学部件产生不良影响。本发明的光学多光束扫描装置具有多个预偏转光学单元,光路合成部件和多余的光处理部件。预偏转光学单元为来自光源的光束赋予预定的特性。当预偏转光学单元赋予光束预定的特性时或同时赋予光束预定的特性时,光路合成部件将来自所有或一些光源的光束的光路在水平扫描方向上对准。多余的光处理部件处理从不是光路合成部件的入射面也不是出射面的多余的发光面发出的多余的光。过量光处理部件具有多级锥形结构,其具有多个倾斜角不同的锥形表面,与过量光发射表面大致平行的吸收表面,用于吸收从过量光发射表面发射的过量光,或者局部重复用于分散从过量发光表面发出的过量光的图案。

著录项

  • 公开/公告号US2005225627A1

    专利类型

  • 公开/公告日2005-10-13

    原文格式PDF

  • 申请/专利权人 YASUSHI KURIBAYASHI;

    申请/专利号US20040820750

  • 发明设计人 YASUSHI KURIBAYASHI;

    申请日2004-04-09

  • 分类号B41J15/14;B41J27/00;

  • 国家 US

  • 入库时间 2022-08-21 22:26:00

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