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Process to optimize properties of polymer pellicles and resist for lithography applications
Process to optimize properties of polymer pellicles and resist for lithography applications
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机译:优化用于光刻应用的聚合物防护膜和抗蚀剂性能的方法
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摘要
Disclosed are pellicle compositions and methods of making such pellicle compositions. The pellicle compositions provided include highly fluorinated polymers as well as fluorinated polymer/PVDF co-polymers.
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