首页> 外国专利> Method and device for control of the data flow on application of reticles in a semiconductor component production

Method and device for control of the data flow on application of reticles in a semiconductor component production

机译:用于在半导体部件生产中应用掩模版来控制数据流的方法和装置

摘要

A reticle control system and method in which each reticle is unambiguously assigned a structured reticle data set, and the content of each reticle data set is automatically changed and/or supplemented depending on use of the associated reticle in the semiconductor component production process for which the reticle was produced. The reticle data set is used to identify and control the reticles over the entire production sequence. The ability to change or supplement the reticle data sets facilitates progressively storing production-dictated information related to the use of the associated reticles, thereby enabling effective control of the reticles in the production process.
机译:掩模版控制系统和方法,其中每个掩模版被明确地分配了结构化掩模版数据集,并且每个掩模版数据集的内容根据半导体组件生产过程中相关掩模版的使用而自动改变和/或补充。产生了标线。掩模版数据集用于识别和控制整个生产序列中的掩模版。更改或补充标线数据集的功能有助于逐步存储与相关标线的使用有关的生产指示信息,从而可以在生产过程中有效控制标线。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号