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Method for improving film uniformity in plasma enhanced chemical vapor deposition system
Method for improving film uniformity in plasma enhanced chemical vapor deposition system
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机译:在等离子体增强化学气相沉积系统中改善膜均匀性的方法
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摘要
A method for improving uniformity of a film in a plasma enhanced chemical vapor deposition system in a deposition chamber includes the following steps before a deposition procedure. Firstly, a cleaning procedure is performed to remove particles adhered onto an internal wall of the deposition chamber. Then, a pre-deposition procedure is performed to isolate contaminants generated during the clearing procedure. Afterward, a specified gas is introduced into the deposition chamber so as to stabilize a condition inside the deposition chamber.
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