PREPARATION METHOD FOR COMPOSITE FILMS BY USING A PULSED DC BIAS COUPLED PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEM

摘要

The present invention is an electric field coupling type as a method of manufacturing a conductive metal compound thin film by the plasma chemical vapor deposition, and more particularly, to electronic sayikeu the polymeric substrate surface at room temperature to form the plasma ions by the anthrone resonance plasma, the formed plasma ion an organic metal compound precursor at the same time and supplies at the bottom of the low-frequency direct current positive and negative form a voltage applied to the condensed metal ions, and metal ions so formed are deposited by a chemical bond to the polymer substrate surface in a series of forming composite metallic film by applying a single system, the adhesion with the light transmittance is improved to a method for producing a conductive metal thin film composite application is possible in many areas of the filter for a plastic solar cell, the liquid crystal driving.