首页> 外国专利> REDUCED BARRIER PHOTODIODE/TRANSFER GATE DEVICE STRUCTURE OF HIGH EFFICIENCY CHARGE TRANSFER AND REDUCED LAG AND METHOD OF FORMATION, AND

REDUCED BARRIER PHOTODIODE/TRANSFER GATE DEVICE STRUCTURE OF HIGH EFFICIENCY CHARGE TRANSFER AND REDUCED LAG AND METHOD OF FORMATION, AND

机译:高效电荷转移和迟滞的减少的阻挡层光电二极管/转移门装置结构和形成方法,以及

摘要

A pixel cell having a reduced potential barrier near a region where a gate and a photodiode are in close proximity to one another, and a method for forming the same are disclosed. Embodiments of the invention provide a pixel cell comprising a substrate. A gate of a transistor is formed at least partially below the surface of the substrate and a photodiode is adjacent to the gate. The photodiode comprises a doped surface layer of a first conductivity type, and a doped region of a second conductivity type underlying the doped surface layer. The doped surface layer is at least partially above a level of the bottom of the gate.
机译:公开了一种在栅和光电二极管彼此紧邻的区域附近具有减小的势垒的像素单元及其形成方法。本发明的实施例提供了一种包括基板的像素单元。晶体管的栅极至少部分地形成在基板的表面下方,并且光电二极管与该栅极相邻。该光电二极管包括第一导电类型的掺杂表面层和在该掺杂表面层下面的第二导电类型的掺杂区域。掺杂的表面层至少部分地在栅极的底部的水平上方。

著录项

  • 公开/公告号US2004262609A1

    专利类型

  • 公开/公告日2004-12-30

    原文格式PDF

  • 申请/专利权人 MOULI CHANDRA;RHODES HOWARD E.;

    申请/专利号US20030602721

  • 发明设计人 CHANDRA MOULI;HOWARD E. RHODES;

    申请日2003-06-25

  • 分类号H01L29/04;

  • 国家 US

  • 入库时间 2022-08-21 22:21:39

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