首页>
外国专利>
Method of inspecting a mask or reticle for detecting a defect, and mask or reticle inspection system
Method of inspecting a mask or reticle for detecting a defect, and mask or reticle inspection system
展开▼
机译:检查用于检测缺陷的掩模或掩模版的方法以及掩模或掩模版检查系统
展开▼
页面导航
摘要
著录项
相似文献
摘要
A method of inspecting a mask or reticle, the mask or reticle being provided with a pattern to be transferred onto a semiconductor wafer, the pattern having a defect, includes the step of creating a plurality of logical zones and uniquely associating each of said logical zones with a surface area of said pattern. Then, an inspection rule representing a characteristic sensitivity for detecting a defect is associated with each of said logical zones. An image of said pattern is then recorded and compared with a reference image of an ideal pattern for locating a defect within said pattern. One of said logical zones is then identified with said located defect and that inspection rule which is associated with said identified logical zone is retrieved from a memory. The inspection rule is then applied to a characteristic of said defect for determining, whether said defect is to be repaired. A signal can be issued in response to said determination.
展开▼