首页>
外国专利>
Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM
Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM
展开▼
机译:利用多个相干优化曝光和高透射衰减PSM改进光刻构图的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
A method for optically transferring a lithographic pattern corresponding to an integrated circuit utilizing a high transmission attenuated phase-shift mask onto a semiconductor substrate by use of an optical exposure tool. The method comprising the steps of generating a diffraction pattern corresponding to the lithographic pattern, where the diffraction pattern indicates a plurality of spatial frequency components corresponding to the lithographic pattern; determining which of the spatial frequency components need to be captured by a lens in the optical exposure tool in order to accurately reproduce the lithographic pattern; determining a set of illumination conditions required for the optical exposure tool to capture the spatial frequency components necessary for accurately reproducing the lithographic pattern; and illuminating the high transmission attenuated phase-shift mask with this set of illumination conditions.
展开▼