Method For Improved Lithographic Patterning Utilizing Multiple Coherency Optimized Exposures And High Transmission Attenuated PSM

摘要

Using an optical exposure tool to a method for optically transferring a lithographic pattern corresponding to an integrated circuit utilizing a high transmission attenuated phase-shift mask onto a semiconductor substrate. The method includes the steps of: a step of generating a diffraction pattern corresponding to a lithographic pattern, the diffraction pattern is generated, it characterized in that a diffraction pattern indicating a plurality of spatial frequency components corresponding to said lithographic pattern; Step to which of the spatial frequency components in order to accurately simulate the lithographic pattern determining whether there is a need to be captured by a lens in said optical exposure tool; Determining a set of illumination conditions required for said optical exposure tool to capture said spatial frequency components necessary for accurately simulating the lithographic pattern; And a step of illuminating the high transmission attenuated phase shift mask with said set of said illumination conditions.