Hot filament based vapor phase chemical deposition comprises application of nanometric diamond grain films to silicon nitride, giving a smooth surface

摘要

The hot-filament-based vapor-phase chemical deposition consists of application of nanometric diamond grain films, giving excellent adhesion, to the surface of silicon nitride (Si3N4). The grains undergo continuous renucleation, which gives a smooth nitride surface for immediate use in the cutting of e.g. metal-matrix composites.