METHOD OF FABRICATING NANOCHANNELS AND NANOCHANNELS THUS FABRICATED

摘要

The present invention relates to a method of fabricating at least onenanochannel in a semiconductor material applied on a substrate, comprising thesemiconductor material being subjected to an etching treatment and saidsubstrate to a bonding treatment so as to attach a covering layer to thesubstrate, in which bonding treatment the semiconductor material is applied asbonding agent, and wherein prior to etching, the semiconductor material islocally doped for the formation of electrodes.